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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage
Helbig, Stefan, Kawahira, Hiroichi, Zurbrick, Larry S., Urban, Sabine, Klein, Elizabeth, Singh, SherjangVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801408
File:
PDF, 853 KB
english, 2008