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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications
Lowes, Joyce, Allen, Robert D., Pham, Victor, Meador, Jim, Stroud, Charlyn, Rosas, Ferdinand, Mercado, Ramil-Marcelo L., Slezak, MarkVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846608
File:
PDF, 1.76 MB
english, 2010