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SPIE Proceedings [SPIE 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies - Dalian, China (Monday 26 April 2010)] 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Research on exposure model for DMD-based digital gray-tone mask
Luo, Ningning, Ye, Tianchun, Han, Sen, Gao, Yiqing, He, Shuai, Kameyama, Masaomi, Hu, Song, Rao, YufangVolume:
7657
Year:
2010
Language:
english
DOI:
10.1117/12.865232
File:
PDF, 808 KB
english, 2010