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Models for the Chemical Vapor Deposition of Tin Oxide from Monobutyltintrichloride
Chae, Yongkee, Houf, William G., McDaniel, Anthony H., Allendorf, Mark D.Volume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2181428
File:
PDF, 306 KB
english, 2006