Models for the Chemical Vapor Deposition of Tin Oxide from...

Models for the Chemical Vapor Deposition of Tin Oxide from Monobutyltintrichloride

Chae, Yongkee, Houf, William G., McDaniel, Anthony H., Allendorf, Mark D.
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Volume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2181428
File:
PDF, 306 KB
english, 2006
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