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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Manufacturing implementation of deep-UV lithography for 500-nm devices
Holmes, Steven J., Bergendahl, Albert S., Dunn, Diana D., Guidry, J., Hakey, Mark C., Holland, Karey L., Horr, Andy, Humphrey, Dean C., Knight, Stephen E., Macaluso, D., Norris, Katherine C., Poley, DVolume:
1671
Year:
1992
Language:
english
DOI:
10.1117/12.136040
File:
PDF, 1.14 MB
english, 1992