SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - New resolution-enhancing mask for projection lithography based on in-situ off-axis illumination
Pforr, Rainer, Jonckheere, Rik M., Henke, Wolfgang, Ronse, Kurt G., Jaenen, Patrick, Baik, Ki-Ho, Van den Hove, Luc, Cuthbert, John D.Volume:
1927
Year:
1993
Language:
english
DOI:
10.1117/12.150424
File:
PDF, 1.55 MB
english, 1993