SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Evaluation of a new zirconium-containing, negative-working, single-layer resist with enhanced oxygen and fluorocarbon reactive-ion etch resistance
Ramachandran, Ashwin S., Long, Treva, Rodriguez, Ferdinand, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154775
File:
PDF, 656 KB
english, 1993