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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings
Oh, Yong-Ho, Park, Byung-Sun, Chung, Hai Bin, Choi, Sang-Soo, Choi, Seong-Hak, Yoo, Hyung Joun, Park, Sin-Chong, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175415
File:
PDF, 314 KB
english, 1994