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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Rule-based approach to e-beam and process-induced proximity effect correction for phase-shifting mask fabrication
Pierrat, Christophe, Garofalo, Joseph G., DeMarco, John, Vaidya, Sheila, Otto, Oberdan W., Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175817
File:
PDF, 685 KB
english, 1994