SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
Lai, Kafai, Erdmann, Andreas, Fryer, David, Lam, Michael, Adam, Kostas, Clifford, Chris, Oliver, Mike, Zuniga, Christian, Sturtevant, John, Wang, ChangAn, Mansfield, ScottVolume:
9052
Year:
2014
Language:
english
DOI:
10.1117/12.2046489
File:
PDF, 586 KB
english, 2014