SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Quantitative analysis of chemically amplified negative photoresist using mirror-backed infrared reflection absorption spectroscopy
Gamsky, Chris J., Dentinger, Paul M., Howes, Glenn R., Taylor, James W., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210376
File:
PDF, 471 KB
english, 1995