SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Comparison of particle measurement tools for use with photoresist: film surface versus liquid techniques
Anderson, Michael, Bablouzian, Susan, Gaudet, Michael, Kenyon, Linda L., Turci, Pamela, Jones, Susan K.Volume:
2725
Year:
1996
Language:
english
DOI:
10.1117/12.240083
File:
PDF, 571 KB
english, 1996