SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - X-ray exposure in the manufacture of sub-150-nm gate lines
Lamberti, Angela C., Agnello, Paul D., Crabbe, Emmanuel F., DellaGuardia, Ronald, Oberschmidt, James M., Subbana, Seshu, Wu, Steve, Seeger, David E.Volume:
2723
Year:
1996
Language:
english
DOI:
10.1117/12.240475
File:
PDF, 534 KB
english, 1996