SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Evaluation of the Defense Advanced Lithography Program (DALP) x-ray lithography aligner
Chen, Alek C., Flamholz, Alex L., Krasnoperova, Azalia A., Rippstein, Robert P., Vampatella, Ben R., Gomba, George A., Fair, Robert H., Chu, William, Dimilia, V., Silverman, J. P., Amodeo, R. J., HealVolume:
3048
Year:
1997
Language:
english
DOI:
10.1117/12.275803
File:
PDF, 736 KB
english, 1997