SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Function-integrated alicyclic polymer for ArF chemically amplified resists
Maeda, Katsumi, Nakano, Kaichiro, Iwasa, Shigeyuki, Hasegawa, Etsuo, Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275822
File:
PDF, 447 KB
english, 1997