SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Overview of photoacid generator design for acetal resist systems
Houlihan, Francis M., Nalamasu, Omkaram, Reichmanis, Elsa, Timko, Allen G., Varlemann, Ulrike, Wallow, Thomas I., Bantu, N. R., Biafore, John J., Sarubbi, Thomas R., Falcigno, Pasquale A., Kirner, H.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275848
File:
PDF, 602 KB
english, 1997