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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Optimizing of thin-film interference effects in KrF lithography for 0.15-μm design rules
Oh, Seung-Chul, Kim, Young-Cheol, Nah, Sang-Hoon, Huh, Hoon, Han, Sang-Bum, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388379
File:
PDF, 1.23 MB
english, 2000