SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Electrical critical dimension metrology for 100-nm linewidths and below
Grenville, Andrew, Coombs, Brian, Hutchinson, John M., Kuhn, Kelin J., Miller, David, Troccolo, Patrick M., Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389034
File:
PDF, 1.60 MB
english, 2000