SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Printing high-density patterns with dark-field 193-nm lithography
Wood II, Obert R., White, Donald L., Tennant, Donald M., Cirelli, Raymond A., Sweeney, James R., Blakey, Myrtle I., Griffith, Joseph E., Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435686
File:
PDF, 2.22 MB
english, 2001