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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes
Brodsky, Colin J., Nelson-Thomas, Carla, Cave, Nigel, Sturtevant, John L., Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435774
File:
PDF, 53 KB
english, 2001