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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Production x-ray lithography stepper for 100-nm device fabrication
Li, Xuan, Miyatake, Tsutomu, Hirose, Sayumi, Hirose, Masaoki, Fujii, Kiyoshi, Suzuki, Katsumi, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436646
File:
PDF, 722 KB
english, 2001