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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Mix and match of nanoimprint and UV lithography
Reuther, Freimut, Pfeiffer, Karl, Fink, Marion, Gruetzner, Gabi, Schulz, Hubert, Scheer, Hella-Christin, Gaboriau, Freddy, Cardinaud, Christophe, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436708
File:
PDF, 455 KB
english, 2001