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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Simulation-based Defect Printability Analysis on Alternating Phase Shifting Masks for 193nm Lithography
Pang, Linyong, Yu, Zongchang, Luk-Pat, Gerard T., Chen, Jerry X., Volk, William, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.468205
File:
PDF, 700 KB
english, 2002