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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - In-situ optical emission spectroscopic examination of chrome etch for photomasks
Anderson, Rex, Sandlin, Nicole L., Buie, Melisa J., Su, Clyde, Agarwal, Ashish, Brooks, Cynthia J., Huang, Yi-Chiau, Stoehr, Brigitte C., Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476993
File:
PDF, 625 KB
english, 2002