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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - New repair of clear defects on half-tone PSM using Ga implantation
Nagamura, Yoshikazu, Tanabe, Hiroyoshi, Kanai, Itaru, Tange, Koji, Hosono, Kunihiro, Hayashi, Koki, Ikeda, Hidehiro, Nagashige, Susumu, Ishijima, Mikio, Iwasaki, Hironobu, Kikuchi, YasutakaVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504208
File:
PDF, 636 KB
english, 2003