SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Evaluation of multilayer damage in EUVL mask fabrication process
Tanaka, Yuusuke, Staud, Wolfgang, Weed, J. Tracy, Nishiyama, Iwao, Abe, Tsukasa, Sasaki, Shiho, Hayashi, NaoyaVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.568984
File:
PDF, 310 KB
english, 2004