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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Verification of the modified model of drying process of a polymer liquid film on a flat substrate by experiment
Kagami, Hiroyuki, Komuro, MasanoriVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617105
File:
PDF, 139 KB
english, 2005