SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Aerial image based mask defect detection in dense array structures
Kohle, Roderick, Komuro, Masanori, Hennig, Mario, Pforr, Rainer, Bubke, Karsten, Sczyrba, Martin, Durr, Arndt C.Volume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617303
File:
PDF, 288 KB
english, 2005