![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - The unified mask data format based on OASIS for VSB EB writers
Suzuki, Toshio, Komuro, Masanori, Hirumi, Junji, Hojyo, Yutaka, Kawase, Yuichi, Sakamoto, Shinji, Kuriyama, Koki, Narukawa, Syogo, Hoga, MorihisaVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617423
File:
PDF, 158 KB
english, 2005