SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography
Yoshizawa, Masaki, Komuro, Masanori, Philipsen, Vicky, Leunissen, Leonardus H. A.Volume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617447
File:
PDF, 170 KB
english, 2005