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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Alternated phase-shift mask for 45nm node contact holes patterning
Cantu, Pietro, Flagello, Donis G., Capetti, Gianfranco, Catarisano, Chiara, D'Angelo, Fabrizio, Vaccaro, AlessandroVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656356
File:
PDF, 1.13 MB
english, 2006