SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Model based insertion of assist features using pixel inversion method: implementation in 65nm node
Hung, Chi-Yuan, Hoga, Morihisa, Liu, Qingwei, Sakajiri, Kyohei, Shang, Shumay D., Granik, YuriVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681816
File:
PDF, 1.66 MB
english, 2006