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SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Auxiliary pattern for cell-based OPC
Kahng, Andrew B., Martin, Patrick M., Naber, Robert J., Park, Chul-HongVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.692582
File:
PDF, 339 KB
english, 2006