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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Organic ArF bottom anti-reflective coatings for immersion lithography
Xiang, Zhong, Lin, Qinghuang, Zhuang, Hong, Wu, Hengpeng, Shan, Jianhui, Abdallah, Dave, Yin, Jian, Mullen, Salem, Yao, Huirong, Gonzalez, Eleazar, Neisser, MarkVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.710669
File:
PDF, 516 KB
english, 2007