SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Advanced developer-soluble gap-fill materials and applications
Huang, Runhui, Lin, Qinghuang, Sullivan, Dan, Qin, Anwei, Brown, ShannonVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712299
File:
PDF, 2.19 MB
english, 2007