SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Full-chip process window aware OPC capability assessment
Lugg, Robert, Naber, Robert J., Kawahira, Hiroichi, StJohn, Matt, Zhang, Yunqiang, Yang, Amy, Van Adrichem, PaulVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746839
File:
PDF, 622 KB
english, 2007