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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Optimized OPC approach for process window improvement
Wang, Ching-Heng, Liu, Qingwei, Zhang, LiguoVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.758640
File:
PDF, 372 KB
english, 2008