SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - A study of CD budget in spacer patterning technology
Mukai, Hidefumi, Shiobara, Eishi, Takahashi, Shinya, Hashimoto, KohjiVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.773565
File:
PDF, 1.31 MB
english, 2008