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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - Inverse lithography as a DFM tool: accelerating design rule development with model-based assist feature placement, fast optical proximity correction and lithographic hotspot detection
Prins, Steve, Singh, Vivek K., Rieger, Michael L., Blatchford, James, Chang, Simon, Flanagin, Lewis, Jessen, Scott, O'Brien, Sean, Xiao, Guangming, Lin, Timothy, Dam, Thuc, Gleason, BobVolume:
6925
Year:
2008
Language:
english
DOI:
10.1117/12.774581
File:
PDF, 647 KB
english, 2008