SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - XLR 600i: recirculating ring ArF light source for double patterning immersion lithography
Fleurov, Vladimir, Rokitski, Slava, Bergstedt, Robert, Ye, Hong, O’Brien, Kevin, Jacques, Robert, Trintchouk, Fedor, Figueroa, Efrain, Cacouris, Theodore, Brown, Daniel, Partlo, WilliamVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.776927
File:
PDF, 482 KB
english, 2008