SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Overlay metrology for double patterning processes
Leray, Philippe, Allgair, John A., Raymond, Christopher J., Cheng, Shaunee, Laidler, David, Kandel, Daniel, Adel, Mike, Dinu, Berta, Polli, Marco, Vasconi, Mauro, Salski, BartlomiejVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814182
File:
PDF, 634 KB
english, 2009