SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography
Berro, Adam J., Henderson, Clifford L., Gu, Xinyu, O'Connor, Naphtali, Jockusch, Steffen, Nagai, Tomoki, Ogata, Toshiyuki, Zimmerman, Paul, Rice, Bryan J., Adolph, Elizabeth, Byargeon, Travis, GonzaleVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814295
File:
PDF, 1.25 MB
english, 2009