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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools
Wallow, Thomas I., Henderson, Clifford L., Pierson, Bill, Mizuno, Hiroyuki, Fumar-Pici, Anita, Petrillo, Karen, Anderson, Chris N., Naulleau, Patrick P., Hansen, Steven G., Deng, Yunfei, van Ingen SchVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814457
File:
PDF, 844 KB
english, 2009