SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Optical CD metrology model evaluation and refining for manufacturing
Wang, S.-B., Allgair, John A., Raymond, Christopher J., Huang, C. L., Chiu, Y. H., Tao, H. J., Mii, Y. J.Volume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.815015
File:
PDF, 318 KB
english, 2009