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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Impact of EUV mask absorber defect with pattern-roughness on lithographic images
La Fontaine, Bruno M., Kamo, Takashi, Aoyama, Hajime, Arisawa, Yukiyasu, Kijima, Mihoko, Tanaka, Toshihiko, Suga, OsamuVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846347
File:
PDF, 3.60 MB
english, 2010