![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Layout pattern minimization for next-generation technologies
Jhaveri, Tejas, Rieger, Michael L., Thiele, Joerg, Strojwas, Andrzej J.Volume:
7641
Year:
2010
DOI:
10.1117/12.846367
File:
PDF, 1.68 MB
2010