SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Improving CD uniformity for thermal cured systems in double patterning
Joesten, Lori, Allen, Robert D., Spizuoco, Ken, Liu, Yi, Bae, YoungVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846602
File:
PDF, 874 KB
english, 2010