![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Towards manufacturing of advanced logic devices by double-patterning
Koay, Chiew-seng, Halle, Scott, Holmes, Steven, Petrillo, Karen, Colburn, Matthew, van Dommelen, Youri, Jiang, Aiqin, Crouse, Michael, Dunn, Shannon, Hetzer, David, Kawakami, Shinichiro, Cantone, JasoVolume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879618
File:
PDF, 2.41 MB
english, 2011