![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVIII - Yokohama, Japan (Wednesday 13 April 2011)] Photomask and Next-Generation Lithography Mask Technology XVIII - New CD-SEM metrology method for the side wall angle measurement using multiple detectors
Fukaya, Hiroshi, Konishi, Toshio, Murakawa, Tsutomu, Shida, Soichi, Kuribara, Masayuki, Iwai, Toshimichi, Matsumoto, Jun, Nakamura, Takayuki, Hakii, Hidemitsu, Yonekura, Isao, Kawashita, Masashi, NishVolume:
8081
Year:
2011
Language:
english
DOI:
10.1117/12.899368
File:
PDF, 1.27 MB
english, 2011