SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer
Oria, Lorea, Ruiz de Luzuriaga, Alaitz, Alduncín, Juan A., Pérez-Murano, Francesc, Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916339
File:
PDF, 2.53 MB
english, 2012